Equipment

DC and RF magnetron sputtering device Univex 350 (Leybold systems). The device is used for deposition of thin films of metals, metal alloys, oxides and composites on various substrates.
ALD device Fiji F200 with plasma module and ozone generator (Ultratech/Cambrige NanoTech). The device is used to deposit extremely thin oxide films (few to 100 nm) on various substrates.
Electrochemical measurement systems (Potentiostats/Galvanostats/Frequence analyzers) PARSTAT 2273 (Princeton Applied Research) with electrochemical quartz crystal microgravimetry (EQCM), Autolab 302 (Metrohm Autolab) with rotating disc electrode, Solartron 1280C (Ametek, inc.), Reference 600+ (Gamry instruments). Photoelectrochemical measurement system Zennium CIMPS (Zahner Elektrik). These systems are used for investigation of photoelectrochemical behavior and material characterization in electrolytic solutions for metals, alloys and semiconductors.
Nano-micro indenter (Bruker Hysitron TI Premier)
Optical 3D profilometer (Bruker Contour GT-K)
Simultaneous thermal analysis and thermal decomposition product analysis system: TG, DTA, DSC measuring unit Platinum STA PT1600 (Linseis, Germany) and mass spectrometer Thermostar GSD 320.
Corrosion cabinet Forced draft and controlled humidity corrosion cabinet HCP-108 by Memmert (Germany). Linear corrosion (free of chlorides or other precursors) tests on steel and aluminum alloys can be performed from 30°C to 90°C by varying humidity from 20% to 95% RH. Chamber volume 108 liters.